2017 LithoVision Presenters:
Ryoichi Kawaguchi, Nikon Corporation
Ryoichi Kawaguchi received his Bachelor’s degree in Electrical Engineering from the University of Keio in 1980 before joining Nikon Corporation that same year. During his Nikon tenure, Kawaguchi-san worked with the Nikon Research Corporation of America for two years on scanner stage development, and then returned to Nikon Corporation in the Seiki department as a stage control and electronics design engineer. After that he transitioned to electronics and software development, and then system development. In 2014, Kawaguchi-san assumed responsibility for the Technology Solutions Sector focusing on engineering, applications support, and quality assurance.
Dr. Ady Levy, KLA-Tencor
Dr. Ady Levy serves as Vice President and General Manager at KLA-Tencor. He is responsible for product marketing of KLA-Tencor’s fab and mask shop metrology tools and leads the development of patterning solutions. He joined KLA-Tencor in 1995 and was part of the team that developed scatterometry CD (optical CD), AIM imaging overlay and scatterometry overlay (SCOL) technologies. Prior to joining KLA-Tencor, Dr. Levy was a researcher at the IBM Watson Research Division and completed his Ph.D. at M.I.T. He holds more than 50 patents in semiconductor inspection, metrology and analytical instrumentation.
Dr. Zhibiao Mao, Huali Microelectronics Corporation
Dr. Zhibiao Mao is the patterning department manager, in charge of lithographic, OPC, and etch process development, in the technology development division of Huali Microelectronics Corporation (HLMC). Dr. Mao received his Ph.D. degree from Rensselaer Polytechnic Institute and started his semiconductor career on early research stage of 193nm photoresist at Shipley Company (now Dow Chemicals). He then worked at Intel on lithographic process development and volume production. Before joining HLMC, Dr. Mao was engineering manager at Toppan Photomask (Shanghai).
Dr. Mark Phillips, Intel Corporation
Mark Phillips is an Intel Fellow in the Technology and Manufacturing Group and the director of lithography hardware and solutions at Intel Corporation. He is responsible for working with Intel’s lithography equipment suppliers to maintain a pipeline of new tools and technologies that support the patterning requirements of future Intel process technologies. After earning a Ph.D. in physics from the California Institute of Technology, Phillips joined Intel in 1993 to work on the development of 0.35μm process technology. During his tenure at Intel, Phillips has contributed to every generation of lithography exposure tool, from i-line steppers to 193nm immersion scanners and most recently, extreme ultraviolet scanners. Among his accomplishments, Phillips managed the introduction of the first 193nm immersion scanners into production at Intel. Phillips has served as the primary technical interface to Intel’s exposure tool suppliers since 2002. In recent years, he has also been responsible for defining the roadmap for the factory automation systems that support Intel’s lithography tools, and he has worked on the introduction of new metrology techniques to support lithography. He was appointed an Intel Fellow in 2016.
Dr. Ben Rathsack, Tokyo Electron America
Dr. Ben Rathsack is Senior Director of Product Marketing and Technology at Tokyo Electron America with 15 years of patterning development experience at Tokyo Electron and Texas Instruments. Dr. Rathsack, a Senior Member of Technical Staff (SMTS), has authored/co-authored 45 publications and has 15 granted patents. After completing his B.S. in Chemical Engineering from the University of Illinois at Urbana-Champaign, he received his M.S. and Ph.D. at the University of Texas at Austin.
Dr. Stephen Renwick, Nikon Research Corporation of America
Dr. Stephen Renwick has worked with Nikon subsidiaries in the U.S. since 2000 and is currently the Director of Imaging Physics at Nikon Research Corporation of America. Steve is a frequent contributor to industry conferences, and has published detailed technical papers in conference proceedings as well as introductory articles for non-experts. Steve leads a group of experts working on innovative ways to extend optical lithography, to work with Nikon customers on their advanced development, to merge optical lithography with alternative methods like maskless litho and DSA, and to advance computational photography. Steve’s work, some of which has been patented, currently focuses on the extension of ArF immersion lithography capabilities. Steve holds a Ph.D. in Atomic Physics from Wesleyan University.
Yuichi Shibazaki, Nikon Corporation
Yuichi Shibazaki graduated from Tokyo University, majoring in Mechanical Engineering. He joined Nikon in 1996, focusing on the mechanical aspects of stepper and scanner projection lenses. In 2002, he joined the stage design section and was engaged in reticle stage design, as well as being the chief designer for wafer stages. In 2006, Shibazaki-san began designing the Streamlign Platform, and was named Department Manager of the 1st Development section, responsible for next generation products. In 2015, Shibazaki-san was appointed Sector Manager of the Semiconductor Lithography Business Unit Development Sector, and a Nikon Fellow.
Dr. John Sturtevant, Mentor Graphics
John Sturtevant is the Director of RET Product Development in the Design to Silicon Division at Mentor Graphics Corporation, where he and his team work on OPC models, verification tools and methods, and source mask optimization. Prior to joining Mentor Graphics, John played a variety of lithographic roles at IBM, Motorola, and IDT. He holds a B.A. in chemistry from Carleton College and a Ph.D. in physical chemistry from the University of Texas. John is a past Chairman and Editor for the SPIE Conferences on Advances in Photoresist Technology, as well as Design and Process Integration. He has published over 130 technical papers and holds 5 patents. In 2009, he was named as a SPIE Fellow.
Toshikazu Umatate, Nikon Corporation
Toshikazu Umatate is a Senior Vice President of Nikon Corporation, as well as General Manager of the Nikon Semiconductor Lithography Business Unit. After receiving his Master’s degree in Electronics Engineering at Tokyo University in 1980, Umatate-san joined Nippon Kogaku KK, which was later renamed Nikon Corporation. He has led the Nikon stepper and scanner system design programs, and also developed the lithography control system. He has coauthored many technical articles and holds a number of patents. During his extensive Nikon career Umatate-san has also served as General Manager of Development Headquarters, as well as GM of Sales Headquarters.
Hamid Zarringhalam, Nikon Precision Inc.
Hamid Zarringhalam is Executive Vice President of Nikon Precision. Mr. Zarringhalam first joined Nikon in 1987 and during his tenure with Nikon, has served in various senior management capacities in technology, operations, business development, and other corporate groups. He acted as President of Nikon Precision Europe GmbH for several years and maintains a role as Managing Director. Mr. Zarringhalam received his Bachelor’s degree and MBA in Finance from the University of San Francisco.
Sunday, February 26, 2017
City National Civic - San Jose, CA
1:00 PM - 2:00 PM:
2:00 PM - 5:30 PM:
5:30 PM - 7:00 PM:
Poster Session and Reception