2018 Keynote Speaker
Dr. Harry J. Levinson, GLOBALFOUNDRIES
Dr. Harry J. Levinson is Sr. Director of GLOBALFOUNDRIES’ Strategic Lithography Technology organization and Sr. Fellow. Dr. Levinson spent most of his career working in the field of lithography, starting at AMD. He then spent time at Sierra Semiconductor and IBM before returning to AMD – now GLOBALFOUNDRIES – in 1994. During the course of his career, Dr. Levinson has applied lithography to many different technologies, including bipolar memories, 64Mb and 256Mb DRAM development, the manufacturing of ASICs, thin film heads, flash memories and advanced logic. He was one of the first users of 5x steppers in Silicon Valley and was an early participant in 248 nm and 193 nm lithography. Dr. Levinson also served for several years as the Chairman of the USA Lithography Technology Working Group that participated in the generation of the lithography chapter of the International Technology Roadmap for Semiconductors. He has published numerous articles on lithographic science, and is the author of two books, Lithography Process Control and Principles of Lithography. He holds over 60 US patents. Dr. Levinson is an SPIE Fellow, previously chaired the SPIE Publications Committee, and served on SPIE’s Board of Directors. In recognition of his contributions to SPIE, Dr. Levinson received the Society’s 2014 Directors’ Award. He has a B.S. in engineering from Cornell University and a Ph.D. in physics from the University of Pennsylvania.
2018 LithoVision Presenters Confirmed:
John J. Biafore, KLA-Tencor
John J. Biafore has worked on the design and optimization of photoresists and optical lithography processes since 1992. Since 2004, John has worked solely on computational lithography methods, when he joined the KLA-Tencor PROLITH group as a Research Scientist. His focus in recent years has been the simulation and modeling of stochastic effects in ArF and EUV lithography.
Aaron Bowser, Seagate Technology
Aaron Bowser is a 15-year veteran of Seagate Technology with deep technical expertise in thin-film-head wafer manufacturing and process development. A University of Minnesota alum, he has created lithography-related trade-secrets and patents. Aaron played a critical role in Seagate's implementation of ArF lithography tooling to support Perpendicular Magnetic Recording (PMR) technology. In his current role as Seagate’s Managing Principal Engineer of Lithography Development, Aaron is leading the lithography process transition from PMR to Heat Assisted Magnetic Recording (HAMR).
Boris Habets, Qoniac
Boris Habets is a founding member of Qoniac, in the role of Chief Technology Officer. In this role, he is responsible for the roadmap and new developments, as well as for acquisition of new customers. With Qoniac he developed a software suite for on-product process optimization, diagnostics as well as for monitoring and process control. Boris Habets has broadly based experience in the semiconductor industry. He worked for ASML in the Netherlands, and for Infineon and Qimonda in Dresden, Germany. In these positions he was responsible for overlay and alignment optimization, and development of new analysis methods and tooling. He graduated in applied physics at the Eindhoven University of Technology in the Netherlands. He holds several patents.
Scotten W. Jones, IC Knowledge LLC
Scotten W. Jones (Scott) is the Founder and President of IC Knowledge LLC, the world leader in cost modeling of semiconductor and MEMS. Scott has over 30 years of experience in the semiconductor and MEMS industries, 23 of those in senior management positions. He holds a B.S. in physics from the University of Rhode Island, has published dozens of papers, books and book length reports and holds two patents. His career focus has been on manufacturing and process technology. Scott's responsibilities have included manufacturing, engineering, IT, technology development, finance and accounting. Scott has built or upgraded several wafers fabs and has extensive experience in manufacturing execution systems, cost modeling, IP licensing agreements, outsourcing and foundry relationships. Scott is a senior member of the IEEE, a member of SEMI and is a lifetime member of Strathmore's Who's Who.
Dr. Uday Mitra, Applied Materials
Dr. Uday Mitra is Vice President, and Chief Technology Officer for the Etch Business Unit and Patterning Module at Applied Materials, Inc. Dr. Mitra has more than 30 years of experience in the semiconductor industry managing technology integration, lithography, etch, thin films and packaging modules for both logic and memory products. Prior to joining Applied in 2005, he was Director of technology integration at Intel Corporation, where he spent 17 years holding various management positions. He also worked at Philips Laboratories as a Senior Member of the Research Staff, and at IBM as an Advisory Engineer. Dr. Mitra received a Bachelor of technology degree from the Indian Institute of Technology, Bombay, and M.S. and Ph.D. in materials science and engineering from the Massachusetts Institute of Technology and is a recipient of the Henry Marion Howe Medal from the American Society of Materials International.
Dr. Stephen Renwick, Nikon Research Corporation of America
Dr. Stephen Renwick has worked with Nikon subsidiaries in the U.S. since 2000 and is currently the Director of Imaging Physics at Nikon Research Corporation of America. Steve is a frequent contributor to industry conferences, and has published detailed technical papers in conference proceedings as well as introductory articles for non experts. Steve leads a group of experts working on innovative ways to extend optical lithography, to work with Nikon customers on their advanced development, and to advance computational imaging. Steve’s work, some of which has been patented, currently focuses on next-generation lithography. Steve holds a Ph.D. in atomic physics from Wesleyan University.
Yuichi Shibazaki, Nikon Corporation
Yuichi Shibazaki graduated from Tokyo University, majoring in mechanical engineering. He joined Nikon in 1996, focusing on the mechanical aspects of stepper and scanner projection lenses. In 2002, he joined the stage design section and was engaged in reticle stage design, as well as being the chief designer for wafer stages. In 2006, Shibazaki-san began designing the Streamlign Platform, and was named Department Manager of the 1st Development section, responsible for next generation products. In 2015, Shibazaki-san was appointed Sector Manager of the Semiconductor Lithography Business Unit Development Sector, and a Nikon Fellow.
Yosuke Shirata, Nikon Corporation
Yosuke Shirata is Department Manager of the Nikon Corporation Customer Solutions department. He joined Nikon in 1991, and began his work as a System Designer for excimer steppers. After developing elements of the NSR alignment system, Shirata-san began managing the heat control system design section. Then, in 2009, he assumed management of overlay and illumination system design, and also was heavily engaged in customer support activities. In 2012, Shirata-san transitioned to the next-generation development section, and led the development of S622C and S630D scanners. Most recently, in 2015 he was named the Customer Solutions Department Manager. Based on his extensive experience, Shirata-san and his team provide solutions to maximize customers’ tool performance.
Dr. Martin Weiss, Intel Corporation
Dr. Martin Weiss is a Principal Engineer with Intel’s Portland Technology Development (PTD) group. Dr. Weiss earned the Bachelor of Science degree in electrical engineering from The Cooper Union for the Advancement of Art and Science in New York. He later earned a Doctorate degree in electrical engineering from the University of Florida, with research on integrated optics and pattern recognition. Dr. Weiss joined Intel in 1997 as a Lithography Engineer, working in the PTD group on the development of the 0.18 µm technology. Dr. Weiss has has been involved with all of Intel’s process nodes for logic and is currently engaged in development next-generation lithography technologies. Dr. Weiss is responsible for Intel’s overlay roadmap, including the technical development of the metrology module and overlay modeling. Dr. Weiss holds 6 patents in the semiconductor field, related to overlay measurement and integrated process flow.
Hamid Zarringhalam, Nikon Precision Inc.
Hamid Zarringhalam is Executive Vice President of Nikon Precision. Hamid first joined Nikon in 1987 and during his tenure with Nikon, has served in various senior management capacities in technology, operations, business development, and other corporate groups. He acted as President of Nikon Precision Europe GmbH for several years and maintains a role as Managing Director. Hamid received his Bachelor’s degree and M.B.A. in finance from the University of San Francisco.
Sunday, February 25, 2018
City National Civic - San Jose, CA
12:30 PM - 1:30 PM:
1:30 PM - 5:30 PM:
5:30 PM - 7:00 PM:
Poster Session and Reception