LithoVision 2019 Presenters
Jérôme Azémar, Yole Développement
As Technical Project Development Director at Yole Développement, Jérôme Azémar is supporting the development of strategic projects, following leading customers of the company within the semiconductor industry, from manufacturing to packaging. His mission is to develop Yole’s business and technical knowledge in the industry, maintain long term relationships with its accounts and meet their expectations. Jérôme is the author of numerous analysis and international publications covering advanced packaging, power electronics and semiconductor manufacturing. Prior to this and upon graduating from INSA Toulouse (France) with a Master’s in microelectronics and applied physics, Jérôme worked three years at ASML as application engineer and two years at STMicroelectronics as process engineer.
Dr. William Blanton, Intel
Will Blanton is a Senior Development Engineer in Intel’s Portland Technology Development group focused on innovative lithography metrology solutions. Since joining Intel in 2002, Will has held a variety of roles from supporting 193/193i scanner development, enabling new metrology methodologies, to creating effective metrology solutions for high volume manufacturing. His work on the application of diffraction-based OVL has been well recognized in industry. Currently, Will leads projects focused on reticle design, factory automation and delivering OVL capabilities to meet next generation EPE requirements. He received his Ph.D. in materials engineering from Purdue University in 2002.
Jonathan Chang, Xilinx
Jonathan Chang is the Senior Director of Foundry Technology Development at Xilinx. Providing robust and reliable leading-edge nodes, as well as 3D-IC wafer processing are his team’s charters. He joined Xilinx in 1997 starting with development at 0.18 µm, and proceeding onward through current day comprising more than 10 generations of technologies, from many foundries. Currently his emphasis is on 7 nm FPGA products as well as future technologies. Mr. Chang received his Master’s degree from San Jose State University, USA.
Dr. Xuemei Chen, KLA
Xuemei Chen is a Senior Product Marketing Manager in KLA responsible for developing and managing product strategies for measurement, analytics, and control of advanced patterning processes. She has extensive experiences in both wafer Fabs and equipment suppliers, including particularly overlay and CD metrology, reticle inspection, and EUV lithography. Xuemei received her Ph.D. degree from the University of California at Berkeley, and serves on the program committee of the SPIE EUV Lithography Conferences.
Dr. Anton DeVilliers, Tokyo Electron America
Anton DeVilliers, born in Oregon, moved to South Africa with his family where he completed his undergraduate degree in physics and solid state physics at the University of Cape Town. After returning to America, he completed his studies at the Oregon Center for Optics at the University of Oregon. His professional career began at Hyundai Semiconductor in Eugene, Oregon which later became Hynix. Afterwards, he held Lithography R&D Area Manager positions at Maxim, Cypress Semiconductor, and then at Micron where he led the lithography technology team having responsibilities for optical and chemical lithography R&D. He holds numerous patents including pitch quadrupling and double patterning technologies. Dr. DeVilliers is now with TEL as Director of Patterning Technology responsible for advanced lithography and patterning technologies.
Scotten W. Jones, IC Knowledge LLC
Scotten W. Jones (Scott) is the Founder and President of IC Knowledge LLC, the world leader in cost modeling of semiconductors and MEMS. Scott has over 35 years of experience in the semiconductor and MEMS industries, and over 25 years in senior management positions. He holds a B.S. in physics from the University of Rhode Island, has published dozens of papers, books and book length reports and holds two patents. His career focus has been on manufacturing and process technology. Scott’s responsibilities have included manufacturing, engineering, IT, technology development, finance and accounting. Scott has built or upgraded several wafers fabs and has extensive experience in manufacturing execution systems, cost modeling, IP licensing agreements, outsourcing and foundry relationships. Scott is a senior member of the IEEE, a member of SEMI and is a lifetime member of Strathmore’s Who’s Who.
Dr. Chris Progler, Photronics
Dr. Chris Progler has spent more than 30 years pushing boundaries in advanced lithography first with top chip makers such as IBM, Texas Instruments and ST Microelectronics and now as Chief Technology Officer with global IC and display photomask producer Photronics. His current work includes global R&D, product development and strategic ventures. Dr. Progler is on the Board of Directors for two leading Asia photomask joint venture companies - PDMC in Taiwan and PDMCX in China. He is a Board Member of US EUV photoresist company Inpria and a Fellow of SPIE. He previously served as a Management Board Member of IMS Nanofabrication, MP Mask LLC and was a Scientific Advisory Board Member for Cymer Laser. He teaches university level courses in lithography, chaired multiple conferences and holds many contributed papers in the field of lithography and mask technology.
Dr. Stephen Renwick, Nikon Research Corporation America
Dr. Stephen Renwick has been working on leading-edge lithography since starting with the first ArF scanners in 1996. He has worked with Nikon subsidiaries in the U.S. since 2000 and is currently the Director of Imaging Physics at Nikon Research Corporation of America. Steve is a frequent contributor to industry conferences such as SPIE Advanced Lithography and the invitation-only Lithography Workshop. At Nikon, Steve has been engaged in critical leading-edge lithography projects including scanner matching for OPC, detailed scanner performance prediction, and investigations of lithographic extension technologies like directed self-assembly. Steve's work currently focuses on the development of imaging solutions to further extend ArF immersion lithography capabilities. Steve holds a Ph.D. in atomic physics from Wesleyan University.
Yuichi Shibazaki, Nikon Corporation
Yuichi Shibazaki graduated from Tokyo University, majoring in mechanical engineering. He joined Nikon in 1996, focusing on the mechanical aspects of stepper and scanner projection lenses. In 2002, he joined the stage design section and was engaged in reticle stage design, as well as being the Chief Designer for wafer stages. In 2006, Shibazaki-san began designing the Streamlign Platform, and was named Department Manager of the 1st Development section, responsible for next-generation products. In 2015, Shibazaki-san was appointed Sector Manager of the Semiconductor Lithography Business Unit Development Sector, and a Nikon Fellow.
Toshikazu Umatate, Nikon Corporation
Toshikazu Umatate is a Senior Vice President of Nikon Corporation, as well as General Manager of the Nikon
Semiconductor Lithography Business Unit. In 2018, Umatate-san was appointed Chief Technology Officer of Nikon Corporation. After receiving his Master’s degree in electronics engineering at The University of Tokyo in 1980, Umatate-san joined Nippon Kogaku KK, which was later renamed Nikon Corporation. He has led the Nikon stepper and scanner system design programs, and also developed the lithography control system. He has coauthored many technical articles and holds a number of patents. During his extensive Nikon career, Umatate-san has also served as General Manager of Development Headquarters, as well as GM of Sales Headquarters.
Hamid Zarringhalam, Nikon
Hamid Zarringhalam is Executive Vice President of Nikon Precision, and Co-General Manager of the Precision Components and Modules Business Unit in Nikon Corporation in Japan. As Co-GM of Nikon’s newly established Precision Components Business Unit, Mr. Zarringhalam is responsible for leading creation and execution of strategies aimed at leveraging Nikon’s core competencies to enable new partnerships that drive growth. In parallel, as EVP of Nikon Precision, he is responsible for Nikon’s strategic partnership activities in Semiconductor Lithography in the United States. Mr. Zarringhalam joined Nikon in 1987 after receiving his MBA from the University of San Francisco. In his many years with Nikon, he has served in various senior management capacities in technology, operations, business development, and other corporate groups.
Sunday, February 24, 2019
City National Civic - San Jose, CA
1:00 PM - 2:00 PM:
2:00 PM - 5:30 PM:
5:30 PM - 7:00 PM:
Poster Session and Reception